Experimental study of the influence of nanoparticle generation on the electrical characteristics of argon-silane capacitive radio-frequency plasmas

被引:16
|
作者
Shen, Z [1 ]
Kortshagen, U [1 ]
机构
[1] Univ Minnesota, Dept Mech Engn, High Temp & Plasma Lab, Minneapolis, MN 55455 USA
关键词
D O I
10.1116/1.1427894
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The nonintrusive detection of particle contamination problems is of great interest to plasma processing in the manufacture of semiconductors. We have studied the influence of particle generation in argon-silane capacitive plasmas on the electrical discharge properties which can be nonintrusively measured with a current-voltage sensor. The Fourier components of the rf current and voltage and the respective phase angles between these signals have been studied up to the fifth harmonic of the 13.56 Mhz rf power. We show that in particular higher harmonics are much more sensitive to the appearance of particles than the signals at the fundamental frequency or the second harmonic. It appears that the observation of higher harmonics is capable of providing early indication of particle growth in capacitive rf discharges. (C) 2002 American Vacuum Society.
引用
收藏
页码:153 / 159
页数:7
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