Plasma deposition of thiophene derivatives under atmospheric pressure

被引：37
|
作者：
Dams, Roel
Vangeneagden, Dirk
Vanderzande, Dirk
机构：
[1] Flemish Inst Technol Res, VITO, B-2400 Mol, Belgium
[2] Univ Hasselt, Div Chem, Inst Mat Res, IMO, B-3590 Diepenbeek, Belgium
来源：
CHEMICAL VAPOR DEPOSITION | 2006年 / 12卷 / 12期
关键词：
atmospheric pressure; conducting polymers; conjugated polymers; plasma; thiophenes;
D O I：
10.1002/cvde.200606483
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3-methylthiophene, and 3,4-ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, UV-vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4-ethylenedioxythiophene). Conductivities of up to 1 x 10(-2) S cm(-1) are measured.
引用
收藏
页码：719 / 727
页数：9
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