Dielectrically embedded flat mesh lens for millimeter waves applications

被引:23
|
作者
Pisano, Giampaolo [1 ]
Ming Wah Ng [1 ]
Ozturk, Fahri [1 ]
Maffei, Bruno [1 ]
Haynes, Vic [1 ]
机构
[1] Univ Manchester, Sch Phys & Astron, Manchester M13 9PL, Lancs, England
基金
英国工程与自然科学研究理事会;
关键词
PHOTOLITHOGRAPHIC POLARIZER;
D O I
10.1364/AO.52.002218
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A flat lens based on subwavelength periodic metal meshes has been developed using photolithographic techniques. These mesh grids are stacked at specific distances and embedded in polypropylene. A code was developed to optimize more than 1000 transmission line circuits required to vary the device phase shift across the lens flat surface, mimicking the behavior of a classical lens. A W-band mesh-lens prototype was successfully manufactured and its RF performance characterized using a vector network analyzer coupled to corrugated horn antennas. Co-polarization far-field beam patterns were measured and compared with finite-element method models. The excellent agreement between data and simulations validated our designing tools and manufacturing procedures. This mesh lens is a low-loss, robust, light, and compact device that has many potential applications including millimeter wave quasi-optical systems for future cosmic microwave background polarization instruments. (C) 2013 Optical Society of America
引用
收藏
页码:2218 / 2225
页数:8
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