Fabrication of Fresnel zone plates by holography in the extreme ultraviolet region

被引：7
|
作者：
Sarkar, Sankha S. [1 ]
Sahoo, Pratap K. [1 ]
Solak, Harun H. [1 ,2 ]
David, Christian [1 ]
Van der Veen, J. Friso [1 ]
机构：
[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[2] EULITHA AG, CH-5232 Villigen, Switzerland
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2008年 / 26卷 / 06期
关键词：
diffractive optical elements; Fresnel diffraction; holography; integrated optics; micro-optics; nanolithography; optical fabrication; ultraviolet lithography; zone plates;
D O I：
10.1116/1.2987960
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Fabrication of Fresnel zone plates (FZPs) with nanometer scale resolution is one of the major challenges in lithographic fabrication. The authors present a holographic approach to create FZPs where the interference pattern between a spherical beam and a plane wave is recorded to obtain the FZP structure. The spherical beam is obtained by diffraction from a circular aperture (pinhole) in a semiopaque membrane which is illuminated by a spatially coherent extreme ultraviolet beam. The beam transmitted by the membrane serves as the reference plane wave. The resulting pattern gives rise to a FZP with outermost zone width comparable to the dimension of the circular aperture. Fabrication and test results of a FZP obtained with this method are presented. The technique offers a solution to the pattern-placement problem encountered in serial ZP writing techniques as well as high resolution potential.
引用
收藏
页码：2160 / 2163
页数：4
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