Effects of the morphology of ZnO/Ag interface on the surface-plasmon-enhanced emission of ZnO films

被引:70
|
作者
You, J. B. [1 ]
Zhang, X. W. [1 ]
Fan, Y. M. [1 ]
Yin, Z. G. [1 ]
Cai, P. F. [1 ]
Chen, N. F. [1 ]
机构
[1] CAS, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1088/0022-3727/41/20/205101
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of the surface morphology of Ag on the surface-plasmon-enhanced emission of ZnO films have been studied for a ZnO/Ag/Si system by photoluminescence spectroscopy and atomic force microscopy. The results indicate that the enhancement of ZnO ultraviolet emission is dependent on the deposition conditions of the Ag interlayers. By examining the dependence of the enhancement ratio of surface-plasmon-mediated emission on the characteristic parameters of Ag surface morphology, we found that the surface plasmon coupling to light is determined by both the Ag particle size and density.
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页数:4
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