RESIDUAL ELASTIC STRAIN OF AISI 304 STAINLESS STEEL SHEETS COVERED WITH A TITANIUM NITRIDE THIN FILM DEPOSITED BY PVD-MAGNETRON SPUTTERING

被引：0

作者：

Colorado, H. A. ^{[1
]}

Salva, H. R. ^{[2
]}

Ghilarducci, A. A. ^{[2
]}

机构：

[1] Univ Antioquia, Dept Ingn Mecan, Medellin, Colombia

[2] Univ Nacl Cuyo, CONICET, Inst Baleiro, Ctr Atom Bariloche CNEA, San Carlos De Bariloche, Rio Negro, Argentina

来源：

DYNA-COLOMBIA | 2009年 / 76卷 / 160期

关键词：

AISI 304 stainless steel; thin solid films; TiN; residual elastic strain; XRD; COATINGS; MARTENSITE; ALPHA';

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

X Ray Diffraction characterization was carried out on AISI 304stainless steel sheets covered with a 3 mu m thick titanium nitride film. The deposition technique used was PVD-Magnetron Sputtering at 200 degrees C. The resulting microstructures of the substrate, the film and the interface were studied by Optical Microscopy (OM), Scanning Electron (SEM) and Atomic Force (AFM) Microscopes. Residual elastic strain associated with the X- ray diffraction (XRD) broadening peaks was also determined.

引用

页码：207 / 215

页数：9

共 20 条

[1] Thin Niobium and Niobium Nitride PVD Coatings on AISI 304 Stainless Steel as Bipolar Plates for PEMFCs
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[2] Duplex treatment of AISI 304 austenitic stainless steel using rf nitriding and dc reactive magnetron sputtering of titanium
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[3] A MORPHOLOGICAL AND AN ELECTROCHEMICAL CHARACTERIZATION OF A PVD TITANIUM FILM DEPOSITED UPON AN AISI 316L STAINLESS STEEL
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[4] Deposition of titanium nitride thin films on stainless steel - AISI 304 substrates using a plasma focus device
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[5] DCEMS Study of Thin Oxide Layers and Interface of Stainless Steel Films Deposited by Sputtering Austenitic AISI304
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[7] RESIDUAL-STRESS AND PLASTIC STRAIN IN AISI 304L STAINLESS-STEEL TITANIUM FRICTION WELDS
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[8] Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering
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[9] Tunable hydrophilicity in a surface nano-textured stainless steel thin film deposited by DC magnetron sputtering
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[10] The Effect of Substrate Bias Voltage on the Electrochemical Corrosion Behaviors of thin Film Deposited on Stainless Steel by r. f Magnetron Sputtering
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