Effect of interfacial defects on the electronic properties of graphene/g-GaN heterostructures

被引:9
|
作者
Deng, Zhongxun [1 ]
Wang, Xianhui [1 ]
Cui, Jie [1 ]
机构
[1] Xian Univ Technol, Sch Mat Sci & Engn, Shanxi Prov Key Lab Elect Mat & Infiltrat Technol, Xian 710048, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
HEXAGONAL BORON-NITRIDE; INITIO MOLECULAR-DYNAMICS; OPTICAL-PROPERTIES; MOS2; MONOLAYER; SEMICONDUCTOR; TRANSISTORS; STATES;
D O I
10.1039/c9ra01576k
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
To gain deep insights into their interactions, the effects of interfacial defects on the structural and electronic properties of graphene/g-GaN heterostructures were investigated by using first-principles calculations. The graphene/g-GaN-V-Ga heterostructure maintains a p-type Schottky contact in the spin-up channel and the Schottky barrier height (SBH) is decreased to 0.332 eV, but there is not a metal/semiconductor contact in the spin-down channel. However, the n-type SBH is negative for the graphene/g-GaN-V-N heterostructure, indicating an ohmic contact. Furthermore, the SBH in the graphene/g-GaN heterostructure can be effectively modulated by the interlayer distance. The research could provide a strategy for the development and fabrication of efficient novel nanoelectronic devices.
引用
收藏
页码:13418 / 13423
页数:6
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