Electron-electron scattering rate in thin metal films

被引:4
|
作者
Lugovskoy, AV [1 ]
Bray, I [1 ]
机构
[1] Flinders Univ S Australia, Elect Struct Mat Ctr, Adelaide, SA 5001, Australia
来源
PHYSICAL REVIEW B | 2002年 / 65卷 / 04期
关键词
D O I
10.1103/PhysRevB.65.045405
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The influence of the thickness of a metal film on the electron-electron scattering rate is studied in the framework of the jellium model. It is shown that a one-dimensional confinement of the electrons in the film results in a scattering rate increase by Deltav(k)/l, where v(k) is some anisotropic function of excitation wave vector k, and l is the film thickness. Our calculations show that this increase can be of the order of the bulk scattering rate itself for few-nanometer-thick films. This fact should be taken into account when interpreting experiments with ultrathin films.
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页码:1 / 5
页数:5
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