Focusing mirror for x-ray free-electron lasers

被引：49

作者：

Mimura, Hidekazu ^{[1
]}

Morita, Shinya ^{[2
]}

Kimura, Takashi ^{[1
]}

Yamakawa, Daisuke ^{[1
]}

Lin, Weimin ^{[3
]}

Uehara, Yoshihiro ^{[2
]}

Matsuyama, Satoshi ^{[1
]}

Yumoto, Hirokatsu ^{[4
]}

Ohashi, Haruhiko ^{[4
]}

Tamasaku, Kenji ^{[5
]}

Nishino, Yoshinori ^{[5
]}

Yabashi, Makina ^{[5
]}

Ishikawa, Tetsuya ^{[5
]}

Ohmori, Hitoshi ^{[2
]}

Yamauchi, Kazuto ^{[1
]}

机构：

[1] Osaka Univ, Dept Precis Sci & Technol, Res Ctr Ultra Precis Sci & Technol, Grad Sch Engn, Suita, Osaka 5650871, Japan

[2] RIKEN, Wako, Saitama 3510198, Japan

[3] Akita Prefectural Univ, Fac Syst Sci & Technol, Dept Machine Intelligence & Syst Engn, Akita 0150055, Japan

[4] JASRI SPring 8, Sayo, Hyogo 6795148, Japan

[5] RIKEN SPring 8, Sayo, Hyogo 6795148, Japan

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2008年 / 79卷 / 08期

关键词：

D O I：

10.1063/1.2964928

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 trim. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size. (C) 2008 American Institute of Physics.

引用

页数：4

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