Ellipsometry from infrared to vacuum ultraviolet: Structural properties of thin anisotropic guanine films on silicon

被引:34
|
作者
Hinrichs, K
Silaghi, SD
Cobet, C
Esser, N
Zahn, DRT
机构
[1] Dept Berlin, ISAS, Inst Analyt Sci, D-12489 Berlin, Germany
[2] Tech Univ Chemnitz, D-09107 Chemnitz, Germany
[3] Tech Univ Berlin, Inst Solid State Phys, D-10623 Berlin, Germany
来源
关键词
D O I
10.1002/pssb.200541154
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Bio-molecular films of the DNA base guanine were characterized by ellipsometry from the Infrared (IR) to Vacuum Ultraviolet (VUV) spectral range, X-ray diffraction (XRD) and atomic force microscopy (AFM). In this study we in particular focus on the contact-less and reference-free characterization of thin anisotropic bio-molecular films by ellipsometry. Ellipsometric spectra in the IR as well as in the UV-VUV spectral range are molecule specific and the absorption bands could be used to identify molecules deposited on a substrate, since both the vibrational and electronic excitations are molecule specific. Especially we demonstrate that the measured pseudo-dielectric function in the mid infrared (MIR) spectral range can be used as a characteristic "fingerprint" for DNA base molecules and their orientation in a thin film. Moreover an interpretation of the ellipsometric spectra in an optical model delivers the dielectric function and could give information about the molecular structure, orientation and conductivity. The determination of average molecular orientations from IR and UV/VUV ellipsometry spectra is discussed.
引用
收藏
页码:2681 / 2687
页数:7
相关论文
共 50 条
  • [1] Optical properties of silicon oxynitride thin films determined by vacuum ultraviolet spectroscopic ellipsometry
    Kim, HJ
    Cho, YJ
    Cho, HM
    Kim, SY
    Moon, C
    Cho, GG
    Kwon, Y
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY, 2003, 683 : 171 - 175
  • [2] Spectroscopic ellipsometry from the vacuum ultraviolet to the far infrared
    Woollam, JA
    Hilfiker, JN
    Bungay, CL
    Synowicki, RA
    Tiwald, TE
    Thompson, DW
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2000, INTERNATIONAL CONFERENCE, 2001, 550 : 511 - 518
  • [3] Optical properties of InP from infrared to vacuum ultraviolet studied by spectroscopic ellipsometry
    Subedi, Indra
    Slocum, Michael A.
    Forbes, David V.
    Hubbard, Seth M.
    Podraza, Nikolas J.
    APPLIED SURFACE SCIENCE, 2017, 421 : 813 - 818
  • [4] Infrared ellipsometry investigation of SIOxNy thin films on silicon
    BrunetBruneau, A
    Vuye, G
    Frigerio, JM
    Abeles, F
    Rivory, J
    Berger, M
    Chaton, P
    APPLIED OPTICS, 1996, 35 (25): : 4998 - 5004
  • [6] Progress in spectroscopic ellipsometry: Applications from vacuum ultraviolet to infrared
    Hilfiker, JN
    Bungay, CL
    Synowicki, RA
    Tiwald, TE
    Herzinger, CM
    Johs, B
    Pribil, GK
    Woollam, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (04): : 1103 - 1108
  • [7] INFRARED ELLIPSOMETRY STUDY OF THE VIBRATIONAL PROPERTIES OF GROWING MICROCRYSTALLINE SILICON THIN-FILMS
    BLAYO, N
    DREVILLON, B
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 775 - 778
  • [8] ELLIPSOMETRY OF ANISOTROPIC THIN-FILMS
    DESMET, DJ
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1974, 64 (05) : 631 - 638
  • [9] Vacuum-ultraviolet ellipsometry spectra and structural properties of Pb(Zr,Ti)O3 films
    Suchaneck, G.
    Chvostova, D.
    Kousal, J.
    Zelezny, V.
    Lynnyk, A.
    Jastrabik, L.
    Gerlach, G.
    Dejneka, A.
    THIN SOLID FILMS, 2011, 519 (09) : 2885 - 2888
  • [10] Spirobifluorene molecular films investigated by means of near infrared-vacuum ultraviolet spectroscopic ellipsometry
    Silaphi, Simona D.
    Spehr, Till
    Cobet, Christoph
    Saragi, Tobat P. I.
    Werner, Christoph
    Salbeck, Josef
    Esser, Norbert
    JOURNAL OF APPLIED PHYSICS, 2008, 103 (04)