Radiation-induced defects in SiC-MESFETs after 2-MeV electron irradiation

被引:16
|
作者
Ohyama, H
Takakura, K
Uemura, K
Shigaki, K
Kudou, T
Arai, M
Kuboyama, S
Matsuda, S
Kamezawa, C
Simoen, E
Claeys, C
机构
[1] Kumamoto Natl Coll Technol, Kumamoto 8611102, Japan
[2] JAXA, Ibaraki 3058505, Japan
[3] IMEC, B-3001 Heverlee, Belgium
[4] Katholieke Univ Leuven, EE Dept, B-3001 Heverlee, Belgium
关键词
SiC-MESFET; radiation damage; induced deep levels;
D O I
10.1016/j.physb.2005.12.098
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The impact of radiation damage on the device performance of 4H-SiC metal Schottky field effect transistors, which are irradiated at room temperature with 2-MeV electrons, is studied. No performance degradation is observed by 1 x 10(15) e/cm(2), while a slight increase of the linear drain current together with a decrease of the threshold voltage are noticed for 1 x 10(16) e/cm(2). The degradation for low electron fluence is mainly attributed to the radiation-induced decrease of the Schottky barrier height at the gate contact. For exposures over 1 x 10(16) e/cm(2), the drain current and transconductance decrease. The maximum transconductance for 1 x 10(17) e/cm(2) is only 18% of the value before irradiation. Although no electron capture levels are observed before irradiation, three electron capture levels (E-1-E-3) are induced after irradiation. The observed increase of the channel resistance is due to the induced lattice defects creating electron traps. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:382 / 384
页数:3
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