Radical polymerization of p-substituted styrenes with benzyl phenyl selenide as photoiniferter

被引：13

作者：

Kwon, TS ^{[1
]}

Ochiai, H ^{[1
]}

Kondo, S ^{[1
]}

Takagi, K ^{[1
]}

Kunisada, H ^{[1
]}

Yuki, Y ^{[1
]}

机构：

[1] Nagoya Inst Technol, Dept Mat Sci & Engn, Showa Ku, Nagoya, Aichi 4668555, Japan

来源：

POLYMER JOURNAL | 1999年 / 31卷 / 05期

关键词：

radical polymerization; photoiniferter; benzyl phenyl selenide; p-bromostyrene; p-chloromethylstyrene; p-methylstyrene; p-vinylbenzyl acetate; polymeric photoiniferter; block copolymer;

D O I：

10.1295/polymj.31.411

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Benzyl phenyl selenides were used as photoiniferters for polymerizations of p-bromostyrene, p-chloromethylstyrene, p-methylstyrene, and p-vinylbenzyl acetate. In the limited range of conversion (less than or equal to 50%), polymer yields and number-average molecular weights increased with polymerization time. Polymers from p-methoxybenzyl p-trimethylsilylphenyl selenide contained the benzyl and arylseleno groups at alpha- and omega-chain ends, respectively. Photoirradiation of polystyrene containing a phenylseleno group at the omega-chain end as polymeric photoiniferter afforded effectively block copolymers of styrene and p-substituted styrenes.

引用

页码：411 / 417

页数：7

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Dept. of Mat. Sci. and Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466 8555, Japan
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