Effect of electron reflection on magnetized plasma sheath in an oblique magnetic field

Magnetized plasma sheaths in an oblique magnetic field were extensively investigated by conventionally assuming Boltzmann relation for electron density. This article presents the study of the magnetized sheath without using the Boltzmann relation but by considering the electron reflection along the magnetic field lines caused by the negative sheath potential. A generalized Bohm criterion is analytically derived, and sheath profiles are numerically obtained, which are compared with the results of the conventional model. The results show that the ion Mach number at the sheath edge normal to the wall has a strong dependence on the wall potential, which differs significantly from the conventional model in which the Mach number is independent of the wall potential. The floating wall potential is lower in the present model than that in the conventional model. Furthermore, the sheath profiles are appreciably narrower in the present model when the wall bias is low, but approach the result of the conventional model when the wall bias is high. The sheath thickness decreases with the increase of ion-to-electron temperature ratio and magnetic field strength but has a complex relationship with the angle of the magnetic field. (C) 2015 AIP Publishing LLC.