A two step process to form organothiol self-assembled monolayers on nickel surfaces

被引：13

作者：

Rajalingam, Sundar ^{[1
]}

Devillers, Sebastien ^{[1
]}

Dehalle, Joseph ^{[1
]}

Mekhalif, Zineb ^{[1
]}

机构：

[1] Fac Univ Notre Dame Paix, Lab Chem & Electrochem Surfaces, B-5000 Namur, Belgium

来源：

THIN SOLID FILMS | 2012年 / 522卷

关键词：

Self-assembled monolayers; Nickel oxide reduction; Hydrazine monohydrate; X-ray photoelectron spectroscopy; SCANNING-TUNNELING-MICROSCOPY; N-DODECANESELENOL MONOLAYERS; HYDRAZINE REDUCTION; CHAIN-LENGTH; OXIDE-FILMS; POLYCRYSTALLINE; ALKANETHIOLS; PALLADIUM; COPPER; DODECANETHIOL;

D O I：

10.1016/j.tsf.2012.08.036

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. (C) 2012 Elsevier B. V. All rights reserved.

引用

页码：247 / 253

页数：7

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