X-ray properties and interface study of B4C/Mo and B4C/Mo2C periodic multilayers

被引:13
|
作者
Choueikani, F. [1 ]
Bridou, F. [1 ]
Lagarde, B. [2 ]
Meltchakov, E. [1 ]
Polack, F. [2 ]
Mercere, P. [2 ]
Delmotte, F. [1 ]
机构
[1] Univ Paris Sud, CNRS, Lab Charles Fabry, Inst Opt, F-91127 Palaiseau, France
[2] Synchrotron SOLEIL, F-91192 Gif Sur Yvette, France
来源
关键词
MO/SI MULTILAYERS; DIFFUSION BARRIER; MIRRORS; REFLECTIVITY; STABILITY; LAYERS;
D O I
10.1007/s00339-013-7560-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a comparative study of B4C/Mo and B4C/Mo2C periodic multilayer structures deposited by magnetron sputtering. The characterization was performed by grazing incidence X-ray reflectometry at two different energies and high resolution transmission electron microscopy. The experimental results indicate the existence of an interdiffusion layer at the B4C-on-Mo interface in the B4C/Mo system. Thus, the B4C/Mo multilayers were modeled by an asymmetric structure with three layers in each period. The thickness of B4C-on-Mo interfacial layer was estimated about 1.1 nm. The B4C/Mo2C multilayers present less interdiffusion and are well modeled by a symmetric structure without interfacial layers. This study shows that B4C/Mo2C structure is an interesting alternative to B4C/Mo multilayer for X-ray optic applications.
引用
收藏
页码:191 / 198
页数:8
相关论文
共 50 条
  • [1] X-ray properties and interface study of B4C/Mo and B4C/Mo2C periodic multilayers
    F. Choueikani
    F. Bridou
    B. Lagarde
    E. Meltchakov
    F. Polack
    P. Mercere
    F. Delmotte
    Applied Physics A, 2013, 111 : 191 - 198
  • [2] Non-destructive X-ray study of the interphases in Mo/Si and Mo/B4C/Si/B4C multilayers
    Maury, H.
    Jonnard, P.
    Andre, J. -M.
    Gautier, J.
    Roulliay, M.
    Bridou, F.
    Delmotte, F.
    Ravet, M. -F.
    Jerome, A.
    Holliger, P.
    THIN SOLID FILMS, 2006, 514 (1-2) : 278 - 286
  • [3] CHARACTERIZATION OF MO/B4C MULTILAYERS
    JANKOWSKI, AF
    PERRY, PL
    THIN SOLID FILMS, 1991, 206 (1-2) : 365 - 368
  • [4] Studies on the stress and thermal properties of Mo/B4C and MoxC1-x/B4C multilayers
    Zhu, Jingtao
    Ji, Bin
    Zhu, Jie
    Jiang, Hui
    Zhu, Shengming
    Li, Miao
    Zhang, Jiayi
    MATERIALS RESEARCH EXPRESS, 2020, 7 (03)
  • [5] Thermal stability of Mo/B4C multilayers
    Barthelmess, Miriam
    Bajt, Sasa
    DAMAGE TO VUV, EUV, AND X-RAY OPTICS III, 2011, 8077
  • [6] Interface characteristics of Mo/Si and B4C/Mo/Si multilayers using non-destructive X-ray techniques
    Maury, H.
    Jonnard, P.
    Andre, J.-M.
    Gautier, J.
    Bridou, F.
    Delmotte, F.
    Ravet, M.-F.
    SURFACE SCIENCE, 2007, 601 (11) : 2315 - 2322
  • [7] Thermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films
    Nyabero, S. L.
    van de Kruijs, R. W. E.
    Yakshin, A. E.
    Zoethout, E.
    Bijkerk, F.
    JOURNAL OF APPLIED PHYSICS, 2012, 112 (05)
  • [8] Structural characteristic of Mo/B4C soft X-ray multilayer mirrors
    Lu, Junxia
    Ma, Yueying
    Pei, Shu
    Chen, Xingdan
    Cao, Jianlin
    Guangzi Xuebao/Acta Photonica Sinica, 2000, 29 (05): : 459 - 461
  • [9] Normal-incidence Mo/B4C soft X-ray multilayer
    Lu, Junxia
    Ma, Yueying
    Zhang, Junping
    Cao, Jianlin
    Guangxue Xuebao/Acta Optica Sinica, 1998, 18 (01): : 109 - 111
  • [10] STABILITY OF SPUTTERED MO/BN, W/BN, MO/B4C, AND W/B4C SOFT-X-RAY MULTILAYERS UNDER EXPOSURE TO MULTIPOLE-WIGGLER RADIATION
    YANAGIHARA, M
    MAYAMA, K
    GOTO, Y
    KUSUNOKI, I
    ASAOKA, S
    MAEZAWA, H
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1993, 334 (2-3): : 638 - 642