Nanoscale lithography with frequency-modulation atomic force microscopy

被引：7
|
作者：
Hamada, Masayuki [1 ]
Eguchi, T. [1 ]
Akiyama, K. [2 ,3 ]
Hasegawa, Y. [1 ]
机构：
[1] Univ Tokyo, Inst Solid State Phys, Chiba 2778581, Japan
[2] Tohoku Univ, WPI Adv Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808579, Japan
[3] Tohoku Univ, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 2008年 / 79卷 / 12期
关键词：
atomic force microscopy; elemental semiconductors; force sensors; gold; nanolithography; nanopatterning; nanostructured materials; silicon; vacuum deposition;
D O I：
10.1063/1.3043435
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A lithographic method to draw nanoscale structures by repetitive depositions of the tip material by field evaporation has been developed based on frequency-modulation atomic force microscopy (FM-AFM). Because of high stiffness of quartz tuning forks, a force sensor in the AFM, unwanted mechanical contact of the AFM tip with the substrate was prevented. Precise control of the tip-substrate gap distance with FM-AFM and a gold tip sharpened with focused ion beam enable us to deposit gold dots as small as similar to 20 nm in size and construct nanoscale patterns.
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页数：4
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