Synthesis of Copper Nanoparticles by a High Power Pulse Hollow Cathode

被引:0
|
作者
Pilch, I. [1 ]
Soderstrom, D. [1 ]
Brenning, N. [2 ]
Helmersson, U. [1 ]
机构
[1] Linkoping Univ, IFM Mat Phys Plasma & Coatings Phys Div, SE-58183 Linkoping, Sweden
[2] Royal Inst Technol, Sch Elect Engn, Div Space & Plasma Phys, SE-10044 Stockholm, Sweden
关键词
nanoparticle; hollow cathode; sputtering; plasma; pulsed power;
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A novel plasma-based nanoparticle synthesis method was used for synthesizing copper nanoparticles. High power pulses were applied to a cylindrical hollow cathode providing a high density and a high degree of ionization of the sputtered material. The variation of the nanoparticle size distributions were analyzed from scanning electron microscopy images and studied with respect to varied pulse parameters, e.g., pulse width and peak current. It was found that the nanoparticle size can be changed in a range between 10 and 40 nm by varying the pulse parameters.
引用
收藏
页码:371 / 373
页数:3
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