The influence of enhanced nucleation on thin-film growth

被引：14
|
作者：
Breeman, M [1 ]
Michely, T [1 ]
Comsa, G [1 ]
机构：
[1] FORSCHUNGSZENTRUM JULICH, FORSCHUNGSZENTRUM, INST GRENZFLACHENFORSCH & VAKUUMPHYS, D-52425 JULICH, GERMANY
来源：
SURFACE SCIENCE | 1997年 / 370卷 / 01期
关键词：
atomistic dynamics; computer simulations; epitaxy; growth; nucleation; surface roughening; surface structure; morphology; roughness; and topography;
D O I：
10.1016/S0039-6028(96)01130-2
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We have used kinetic Monte Carlo simulations to study the influence of enhanced nucleation on the growth of epitaxial thin films. Enhanced nucleation was achieved by depositing four-atom clusters in addition to single atoms. The influence of this additional process on the island density, the island size distribution and the surface morphology are investigated as a function of the height of the Ehrlich-Schwoebel barrier for interlayer diffusion.
引用
收藏
页码：L193 / L200
页数：8
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