Analysis of the Homogeneous Thermal Decomposition of the Tungsten Dimethylhydrazido Complex Cl4(CH3CN)W(NNMe2) Using in situ Raman Spectroscopy and DFT Calculations

被引:3
|
作者
Lee, Jooyoung [1 ]
Kim, Dojun [1 ]
Kim, Oh Hyun [1 ]
Anderson, Tim [1 ]
Koller, Juergen [2 ]
Denomme, Dan [2 ]
Habibi, Sophia Z. [2 ]
McElwee-White, Lisa [2 ]
机构
[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Chem, Gainesville, FL 32611 USA
基金
美国国家科学基金会;
关键词
BOND-DISSOCIATION ENERGIES; COPPER METALLIZATION; DIFFUSION BARRIER; FILM PROPERTIES; THIN-FILMS; RADICALS; CVD; CL-4(RCN)W(NC3H5); METHYLNITRENE; BENZONITRILE;
D O I
10.1149/1.3490279
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The gas-phase decomposition pathways of the tungsten dimethylhydrazido complexes Cl-4(RCN)W(NNMe2) (1a: R = CH3; 1b: R = Ph), precursors for single source deposition of WNxCy, were investigated using a combination of experiments and calculations. Raman scattering experiments were performed in an impinging-jet, up-flow, aerosol-assisted CVD reactor to identify reaction intermediates. Density Functional Theory calculations (B3LYP/LanL2DZ) were used to estimate Raman active frequencies and explore the reaction surface. Dimethylamine and methylmethyleneimine, products from N-N cleavage of the hydrazido ligand, were observed under deposition conditions and identified by comparison with previously reported Raman shifts and calculated frequencies.
引用
收藏
页码:15 / 26
页数:12
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