Improvement of the Crystalline Quality of β-Ga2O3 Films by High-Temperature Annealing

被引:3
|
作者
Takahara, Motoki [1 ]
Funasaki, Suguru [1 ]
Kudou, Jyun [1 ]
Tsunoda, Isao [1 ]
Takakura, Kenichiro [1 ]
Ohyama, Hidenori [1 ]
Nakashima, Toshiyuki [2 ]
Shibuya, Mutsuo [3 ]
Murakami, Katsuya [4 ]
Simoen, Eddy [5 ]
Claeys, Cor [6 ]
机构
[1] Kumamoto Natl Coll Technol, 2659-2 Suya, Kumamoto 8611102, Japan
[2] Chuo Denshi Kogyo Co Ltd, Tokyo 1540004, Japan
[3] Echo Mother, Kumamoto 8612401, Japan
[4] Japan Gas Chemi, Kumamoto 8612403, Japan
[5] IMEC, B-3001 Louvain, Belgium
[6] Katholieke Univ Leuven, Dept EE, B-3001 Louvain, Belgium
关键词
Gallium oxide; Transparent conducting oxide; Impurity doping; Sputtering; EDX; XRD; SEM; THIN-FILMS; OPTICAL-ABSORPTION;
D O I
10.4028/www.scientific.net/MSF.725.273
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
For the purpose of improving the crystalline quality of undoped and Si-doped beta-Ga2O3 films, high-temperature annealing at 900 degrees C was performed. The crystalline quality of the films has been investigated using scanning electron microscopy and X-ray diffraction. Also the conductivity of the films is compared before and after the annealing. After the 900 degrees C annealing, the XRD peak intensity corresponding to beta-Ga2O3 is increased. This result indicates that the crystalline quality improves by the high-temperature annealing.
引用
收藏
页码:273 / +
页数:2
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