DIGITAL PROCESSING OF OPTICAL EMISSION SPECTRA OF MAGNETRON SPUTTERING PLASMA SYSTEM

被引：0

作者：

Afanasieva, I. A. ^{[1
]}

Afanasiev, S. N. ^{[1
,2
]}

Azarenkov, N. A. ^{[1
]}

Bobkov, V. V. ^{[1
]}

Gritsyna, V. V. ^{[1
]}

Logachev, Yu E. ^{[1
]}

Okseniuk, I. I. ^{[1
]}

Skrypnyk, A. A. ^{[1
]}

Shevchenko, D., I ^{[1
]}

Chornous, V. M. ^{[3
]}

机构：

[1] Kharkov Natl Univ, Kharkov, Ukraine

[2] Kharkov Inst Phys & Technol, Natl Sci Ctr, Kharkov, Ukraine

[3] Ivano Frankivsk Natl Tech Univ Oil & Gas, Ivano Frankivsk, Ukraine

来源：

PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY | 2019年 / 02期

关键词：

D O I：

暂无

中图分类号：

O57 [原子核物理学、高能物理学];

学科分类号：

070202 ;

摘要：

To solve the actual problem of the analysis of the sputtered particles radiation during coating deposition in a magnetron sputtering system, a digital technique was proposed for processing the emission spectra of the discharge plasma. A graphic OSA application has been created, which allows obtaining qualitative and quantitative characteristics of the magnetron discharge plasma. The obtained information about the distribution of excited particles along the direction parallel to the axis of the magnetron discharge permits one to control the mode of the discharge operation and, as a consequence, the properties of the deposited coatings.

引用

页码：164 / 167

页数：4

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