Controlled ablation of Langmuir-Blodgett films made by scanning force microscopy

被引：0
|
作者：
Bonfiglio, A [1 ]
Ricci, D [1 ]
DAlleva, S [1 ]
Parodi, MT [1 ]
Bianco, B [1 ]
机构：
[1] UNIV GENOA,DIPARTIMENTO INGN ELETT & ELETTR,I-16145 GENOA,ITALY
来源：
ADVANCED MATERIALS FOR OPTICS AND ELECTRONICS | 1997年 / 7卷 / 03期
关键词：
atomic force microscopy; thin molecular films; lithography;
D O I：
10.1002/(SICI)1099-0712(199705)7:3<141::AID-AMO305>3.3.CO;2-O
中图分类号：
O69 [应用化学];
学科分类号：
081704 ;
摘要：
In this paper we present results concerning the development of a lithographic technique suitable for application to Langmuir-Blodgett films, Controlled ablations of well-defined portions of the film have been made by using a scanning force microscope (SFM), We report the values of the microscope operational parameters that have allowed us either to perform non-destructive imaging or to obtain reproducible ablations of controlled depth, In particular, our analysis has pointed out the importance of the scanning speed in giving rise to such surface modifications. (C) 1997 by John Wiley & Sons, Ltd.
引用
收藏
页码：141 / 148
页数：8
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