Far-infrared bands in plasmonic metal-insulator-metal absorbers optimized for long-wave infrared

被引:8
|
作者
Evans, Rachel N. [1 ]
Calhoun, Seth R. [1 ]
Brescia, Jonathan R. [1 ]
Clearyz, Justin W. [2 ]
Smith, Evan M. [2 ,3 ]
Peale, Robert E. [1 ]
机构
[1] Univ Cent Florida, Phys Dept, Orlando, FL 32816 USA
[2] US Air Force, Res Lab, Sensors Directorate, Wright Patterson AFB, OH 45433 USA
[3] KBRwyle, Beavercreek, OH 45440 USA
关键词
plasmonic;
D O I
10.1557/adv.2019.53
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Metal-insulator-metal (MIM) resonant absorbers comprise a conducting ground plane, a dielectric of thickness t, and thin separated metal top-surface structures of dimension l. The fundamental resonance wavelength is predicted by an analytic standing-wave model based on t, l, and the dielectric refractive index spectrum. For the dielectrics SiO2, AlN, and TiO2, values for l of a few microns give fundamental resonances in the 8-12 mu m long-wave infrared (LWIR) wavelength region. Agreement with theory is better for t/l exceeding 0.1. Harmonics at shorter wavelengths were already known, but we show that there are additional resonances in the far-infrared 20 - 50 mu m wavelength range in MIM structures designed to have LWIR fundamental resonances. These new resonances are consistent with the model if far-IR dispersion features in the index spectrum are considered. LWIR fundamental absorptions are experimentally shown to be optimized for a ratio t/l of 0.1 to 0.3 for SiO2- and AlN-based MIM absorbers, respectively, with TiO2 based MIM optimized at an intermediate ratio.
引用
收藏
页码:667 / 674
页数:8
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