Conducting Implant in Low Frequency Electromagnetic Field

被引:0
|
作者
Valic, B. [1 ,2 ]
Gajsek, P. [2 ]
Miklavcic, D. [3 ]
机构
[1] E NET Okolje, Kajuhova 17, Ljubljana, Slovenia
[2] Inst Non Ionizing Radiat, Ljubljana, Slovenia
[3] Univ Ljubljana, Fac Elect Engn, Ljubljana, Slovenia
关键词
numerical modeling; finite elements; dosimetry; implants; low frequency exposure;
D O I
暂无
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
Based on the medical images, a finite element model of the human body with intramedular nail in the femur was prepared. The model was exposed to low frequency (50 Hz) electromagnetic field with the intensity of ICNIRP reference levels for general public. Calculated current density distribution inside the model was compared to ICNIRP basic restrictions for general public. From the results it can be seen hat the implant increases current density in the region where it is in contact with soft tissue. The increase is significant. ICNIRP basic restrictions are exceeded in limited volume of the tissue in spite of compliance with ICNIRP reference levels for general public. On the other band, the region, where significant increase in the current density is observed, is limited to few cubic centimeters only.
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页码:218 / +
页数:2
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