Study on the law of multiparameter in dipping process

被引:0
|
作者
Chen, Xinxin
Zhang, Xiaorui
Li, Junhui [1 ]
Zhu, Wenhui
机构
[1] Cent S Univ, State Key Lab High Performance Complex Mfg, Changsha 410083, Hunan, Peoples R China
来源
OPTIK | 2018年 / 152卷
关键词
Dipping process; Flip-chip; Multiparameter; Microelectronics packaging; Flux; SOLAR-CELLS; WIRE; THERMOGRAPHY; ELECTRODE; OXIDE;
D O I
10.1016/j.ijleo.2017.09.105
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In order to remove defect and enhance quality of flip-chip bonding, the influence of multiparameter in dipping process is researched. A dipping experimental bed is established, and images of dipping process is recorded by high-speed camera, the relationships between dipping glue quantity and dipping parameters including dipping speed, dipping depth, dipping time and viscosity of flux are discussed. In dipping process, a phenomenon that flux gathers into a mass was observed, and it is the main reason why there is a corrosion phenomenon. And dipping results show a decreasing trend of glue quantity as dipping speed increases, an increasing trend of glue quantity as dipping depth increases and an increasing trend of glue quantity as dipping time increases. The influence of viscosity is divided into two stages, it shows an increasing trend as viscosity increases when viscosity is smaller than 8 Pa S, and it is a decreasing trend as viscosity increases when viscosity is larger than 8 Pa S. (C) 2017 Elsevier GmbH. All rights reserved.
引用
收藏
页码:84 / 91
页数:8
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