Improvement of n-type nc-3C-SiC:H heterojunction emitter for c-Si solar cells

被引:0
|
作者
Shimizu, Kazuki [1 ]
Omondi, Ateto Eric [1 ]
Irikawa, Junpei [1 ]
Miyajima, Shinsuke [1 ]
Konagai, Makoto [1 ,2 ]
机构
[1] Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
[2] Tokyo Inst Technol, Photovolta Res Ctr PVREC, Meguro Ku, Tokyo 1528552, Japan
关键词
minority carrier lifetime; heterojunction silicon solar cells; plasma enhanced chemical vapor deposition; CHEMICAL-VAPOR-DEPOSITION; SILICON;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
We optimized an n-type hydrogenated nanocrystalline cubic silicon carbide (nc-3C-SiC:H) emitter by changing the plasma power density and monomethylsilane (MMS) flow rate during buffer layer deposition. Quasi-steady state photoconductance (QSSPC) method was carried out to measure the effective lifetime and implied open circuit voltage (implied-V-oc). The implied-V-oc above 0.7 V was achieved with the plasma power density of 1.6 W/cm(2) and MMS flow rate of 2.75 sccm. These result indicates that the properties of n-type nc-3C-SiC:H emitter strongly depend on the deposition condition of a-SiC:H buffer layer.
引用
收藏
页码:1253 / 1256
页数:4
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