TRANSFER-CONDITON OPTIMIZATION OF AN ELECTROCHEMICAL-BASED NANOIMPRINT LITHOGRAPHY FOR 1: 1 TRANSFER OF THIN-FILM EDGE ELECTRODES

被引：0

作者：

Li, Yongfang ^{[1
]}

Toshiyoshi, Hiroshi ^{[2
]}

Fujita, Hiroyuki ^{[3
]}

机构：

[1] Toshiba Co Ltd, Corp Res & Dev Ctr, Kawasaki, Kanagawa, Japan

[2] Univ Tokyo, RCAST, Tokyo, Japan

[3] Univ Tokyo, IIS, Tokyo, Japan

来源：

2017 19TH INTERNATIONAL CONFERENCE ON SOLID-STATE SENSORS, ACTUATORS AND MICROSYSTEMS (TRANSDUCERS) | 2017年

关键词：

Nanoimprint lithography; contact uniformity; transfer uniformity; transfer resolution; functional layer; edge electrode; NANOELECTRODE LITHOGRAPHY;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A mold with a functional on the top surface of protrusion patterns is introduced to prevent meniscus extension and to improve contact uniformity for high resolution and uniform transfer. Design of experiments (DOE) is conducted to optimize the transfer conditions of the thin-film edge electrode lithography for high resolution. As a result, 1: 1 uniform transfer of oxide patterns with a line-width of 25nm is achieved successfully.

引用

页码：1320 / 1323

页数：4

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