Critical behavior of magnetic thin films

被引：22

作者：

Phu, X. T. Pham ^{[1
]}

Ngo, V. Thanh ^{[2
,3
]}

Diep, H. T. ^{[1
]}

机构：

[1] Univ Cergy Pontoise, CNRS, UMR 8089, Lab Phys Theor & Modelisat, F-95302 Cergy Pontoise, France

[2] Inst Phys, Hanoi 10000, Vietnam

[3] POSTECH, Asia Pacific Ctr Theoret Phys, Pohang 790784, South Korea

来源：

SURFACE SCIENCE | 2009年 / 603卷 / 01期

关键词：

Ising model; Monte Carlo simulation; Equilibrium thermodynamics and statistical physics; 3-DIMENSIONAL ISING-MODEL; MONTE-CARLO; GIANT MAGNETORESISTANCE; PHASE-TRANSITIONS; SUPERLATTICES;

D O I：

10.1016/j.susc.2008.10.037

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We study the critical behavior of magnetic thin films as a function of the film thickness. We use the ferromagnetic Ising model with the high-resolution multiple histogram Monte Carlo (MC) Simulation. We show that though the 2D behavior remains dominant at small thicknesses, there is a systematic Continuous deviation of the critical exponents from their 2D values. We explain these deviations using the concept of "effective" exponents Suggested by Capehart and Fisher in a finite size analysis. The shift of the critical temperature with the film thickness obtained here by MC simulation is in an excel lent agreement with their prediction. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：109 / 116

页数：8

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