Highly cost effective and high performance 65nm S3 (Stacked Single-crystal Si) SRAM technology with 25F2, 0.16um2 cell and doubly stacked SSTFT cell transistors for ultra high density and high speed applications

被引:0
|
作者
Jung, SM [1 ]
Rah, Y [1 ]
Ha, T [1 ]
Park, H [1 ]
Chang, CL [1 ]
Lee, S [1 ]
Yun, JH [1 ]
Cho, W [1 ]
Lim, H [1 ]
Park, J [1 ]
Jeong, J [1 ]
Son, B [1 ]
Jang, J [1 ]
Choi, B [1 ]
Cho, H [1 ]
Kim, K [1 ]
机构
[1] Samsung Elect, R&D Ctr, Yongin, South Korea
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中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
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页码:220 / 221
页数:2
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