0.1 μm (Al0.5Ga0.5)0.5In0.5P/In0.2Ga0.8As/GaAs PHEMT grown by gas source molecular beam epitaxy

被引:4
|
作者
Zaknoune, M [1 ]
Schuler, O [1 ]
Mollot, F [1 ]
Théron, D [1 ]
Crosnier, Y [1 ]
机构
[1] Inst Elect & Microelect Nord, UMR CNRS 9929, Dept Hyperfrequences & Semicond, F-59652 Villeneuve Dascq, France
关键词
D O I
10.1049/el:19991196
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have successfully realised a 0.1 mu m T-gate pseudomorphic (Al0.5Ga0.5)(0.5)In0.5P/In0.2Ga0.8As/GaAs high electron mobility transistor (PM-HEMT) grown on a GaAs substrate by gas source molecular beam epitaxy (GSMBE). The electronic transfer and mobility of the (AlxGa1-x)(0.5)In0.5P/In0.2Ga0.8As structure as functions of the aluminium composition have been studied. The ohmic contact has also been optimised. For a single-side doped structure, the devices exhibit the best RF and DC performances of the AlGaInP/InGaAs system with a current density of 430mA/mm and an extrinsic transconductance Gm of 550mS/mm. The cutoff frequencies have been determined to be Ft = 100GHz and Fmax = 160GHz at Vds = 1.5V. These excellent performances clearly show the high-quality material grown by GSMBE.
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收藏
页码:1776 / 1777
页数:2
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