In pursuit of Moore's Law: polymer chemistry in action

We present a focused review of photoresist strategies that have been studied over the past few decades driven by the demands of Moore's law. Selected results are discussed with emphasis on the choice of photoresist chemistry depending on the particulars of each radiation type or patterning strategy, while we present special architectures of photoresists that have attracted a great interest in the semiconductor field. We adopt an approach that allows for easy comparison between the different photoresist categories and we include brief discussions of a number of important preparation and property issues pertaining to key characteristics affecting resist performance.