We demonstrate the application of metal-coated diffraction gratings possessing multiple simultaneous pitch values for surface enhanced infrared absorption (SEIRA) spectroscopy. SEIRA increases the magnitude of vibrational signals in infrared measurements by one of several mechanisms, most frequently involving the enhanced electric field associated with surface plasmon resonance (SPR). While the majority of SEIRA applications to date have employed nanoparticle-based plasmonic systems, recent advances have shown how various metals and structures lead to similar signal enhancement. Recently, diffraction grating couplers have been demonstrated as a highly tunable platform for SEIRA. Indeed, gratings are an experimentally advantageous platform due to the inherently tunable nature of surface plasmon excitation at-these surfaces since both the grating pitch and incident angle can be used to modify the spectral location of the plasmon resonance. In this work, we use laser interference lithography (LIL) to fabricate gratings possessing multiple pitch values by subjecting photoresist-coated glass slides to repetitive exposures at varying orientations. After metal coating, these gratings produced multiple, simultaneous plasmon peaks associated with the multipitched surface, as identified by infrared reflectance measurements. These plasmon peaks could then be coupled to vibrational modes in thin films to provide localized enhancement of infrared signals. We demonstrate the flexibility and tunability of this platform for signal enhancement. It is anticipated that, with further refinement, this approach might be used as a general platform for broadband enhancement of infrared spectroscopy.
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Univ So Calif, Dept Chem, Los Angeles, CA 90089 USAUniv So Calif, Dept Chem, Los Angeles, CA 90089 USA
Hou, Wenbo
Cronin, Stephen B.
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Univ So Calif, Dept Chem, Los Angeles, CA 90089 USA
Univ So Calif, Dept Phys, Los Angeles, CA 90089 USA
Univ So Calif, Dept Elect Engn, Los Angeles, CA 90089 USAUniv So Calif, Dept Chem, Los Angeles, CA 90089 USA
机构:
Tongji Univ, Pohl Inst Solid State Phys, Shanghai 200092, Peoples R China
Tongji Univ, Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R ChinaTongji Univ, Pohl Inst Solid State Phys, Shanghai 200092, Peoples R China
Xue, Chun-hua
Jiang, Hai-tao
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Tongji Univ, Pohl Inst Solid State Phys, Shanghai 200092, Peoples R China
Tongji Univ, Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R ChinaTongji Univ, Pohl Inst Solid State Phys, Shanghai 200092, Peoples R China
Jiang, Hai-tao
Chen, Hong
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Tongji Univ, Pohl Inst Solid State Phys, Shanghai 200092, Peoples R China
Tongji Univ, Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R ChinaTongji Univ, Pohl Inst Solid State Phys, Shanghai 200092, Peoples R China
机构:
Iowa State Univ, Dept Chem & Biol Engn, Ames, IA 50011 USA
Iowa State Univ, Dept Chem, Ames, IA 50011 USAIowa State Univ, Dept Chem & Biol Engn, Ames, IA 50011 USA
Singh, Bipin K.
Hillier, Andrew C.
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Iowa State Univ, Dept Chem & Biol Engn, Ames, IA 50011 USA
Iowa State Univ, Dept Chem, Ames, IA 50011 USAIowa State Univ, Dept Chem & Biol Engn, Ames, IA 50011 USA
机构:
ETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South KoreaETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South Korea
Min, Bok Ki
Van-Tam Nguyen
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ETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South Korea
UST, ICT Adv Device Technol, Sch ETRI, Daejeon 34114, South KoreaETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South Korea
Van-Tam Nguyen
Kim, Seong Jun
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ETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South KoreaETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South Korea
Kim, Seong Jun
Yi, Yoonsik
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ETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South KoreaETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South Korea
Yi, Yoonsik
Choi, Choon-Gi
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ETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South Korea
UST, ICT Adv Device Technol, Sch ETRI, Daejeon 34114, South KoreaETRI, ICT Creat Res Lab, Graphene Res Team, Daejeon 34129, South Korea