Atomic layer deposition of yttria-stabilized zirconia thin films for enhanced reactivity and stability of solid oxide fuel cells

被引：35
|
作者：
Park, Joonho [1 ]
Lee, Yeageun [1 ]
Chang, Ikwhang [2 ]
Cho, Gu Young [1 ]
Ji, Sanghoon [2 ]
Lee, Wonyoung [3 ]
Cha, Suk Won [1 ,2 ]
机构：
[1] Seoul Natl Univ, Dept Mech & Aerosp Engn, Gwanak Ro 1, Seoul 151744, South Korea
[2] Seoul Natl Univ, GSCST, Gwanggyo Ro 145, Suwon 443270, South Korea
[3] Sungkyunkwan Univ, Sch Mech Engn, Seobu Ro 2066, Suwon 440746, South Korea
来源：
ENERGY | 2016年 / 116卷
基金：
新加坡国家研究基金会;
关键词：
Solid oxide fuel cells (SOFCs); Thin films; Atomic layer deposition (ALD); Anodic aluminum oxide (AAO); ELECTROLYTE; FABRICATION; SYSTEM;
D O I：
10.1016/j.energy.2016.09.094
中图分类号：
O414.1 [热力学];
学科分类号：
摘要：
We report the advantages of atomic layer deposition (ALD) for the fabrication of yttria-stabilized zirconia (YSZ) electrolyte. The reactivity and stability of anodic aluminum oxide (AAO)-based thin-film solid oxide fuel cells (SOFCs) are improved by applying ALD YSZ electrolyte. The fuel cell fabricated by ALD shows a peak power density of 154.6 mW cm (-2) at 450 degrees C, whereas the fuel cell fabricated' by sputtering demonstrates a peak power density of 66.2 mW cm (-2). The amorphous and nanogranular microstructure of the ALD YSZ film is ascribed for a significant improvement in the cathodic reactivity of the AAO-based thin-film fuel cells. Moreover, the smooth and uniform surface of the ALD YSZ electrolytes mitigates the agglomeration of the Pt cathode layer, and thus the thermal stability of the thin-film fuel cell is remarkably improved at 450 degrees C. (C) 2016 Elsevier Ltd. All rights reserved.
引用
收藏
页码：170 / 176
页数：7
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