Imprint Process Performance for Patterned Media at Densities Greater than 1Tb/in2

被引：2
|
作者：
Ye, Zhengmao [1 ]
Carden, Scott [1 ]
Hellebrekers, Paul [1 ]
LaBrake, Dwayne [1 ]
Resnick, Douglas J. [1 ]
Melliar-Smith, M. [1 ]
Sreenivasan, S. V. [1 ]
机构：
[1] Mol Imprints Inc, Austin, TX 78758 USA
来源：
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES IV | 2012年 / 8323卷
关键词：
Jet and Flash Imprint Lithography; J-FIL; imprint; patterned media; PM; LITHOGRAPHY; STEP;
D O I：
10.1117/12.918042
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The use of bit pattern media beyond densities of 1Tb/in(2) requires the ability to pattern dimensions to sub 10nm. This paper describes the techniques used to reach these dimensions with imprint lithography and avoid such challenges as pattern collapse, by developing improved resist materials with higher strength, and utilizing a reverse tone J-FIL/R process.
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页数：6
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