Electrical and structural characterization of Ti contacts to Si0.89Ge0.11/Si(001) epilayers

被引：0
|
作者：
Lyakas, M [1 ]
Beregovsky, M [1 ]
Moskowitz, I [1 ]
Eizenberg, M [1 ]
机构：
[1] TECHNION ISRAEL INST TECHNOL,DEPT MAT ENGN,IL-32000 HAIFA,ISRAEL
来源：
SILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS | 1996年 / 402卷
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：475 / 480
页数：6
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