Effect of cerium modification on the formation of colloidal silica

被引：2
|
作者：
Tsai, Ming-Shyong [1 ]
Huang, Po Yuan [1 ]
Wu, Wen-Chang [1 ]
Chen, Cheng-Ho [1 ]
机构：
[1] So Taiwan Univ, Dept Chem & Mat Engn, Tainan, Taiwan
来源：
MATERIALS CHEMISTRY AND PHYSICS | 2009年 / 114卷 / 01期
关键词：
Amorphous materials; Sol-gel synthesis; SHALLOW TRENCH ISOLATION; PARTICLES;
D O I：
10.1016/j.matchemphys.2008.09.033
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
colloidal silica was modified by cerium ion to improve its polishing performance. The active silicic acid was mixed with cerium ion and was then titrated into the seed solution for surface modification via surface growth process. According to the experimental results, we found that the additional cerium ion can improve the surface growing ability on the seed (colloidal silica) surface. The particles size of cerium modified colloidal silica is larger than that without cerium modification. The mean particle size of the modified colloidal silica is decreased by increasing the seed concentration. The removal rate Of SiO(2) of the modified colloidal silica is higher than that of without cerium modification colloidal silica. Crown Copyright (C) 2008 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码：247 / 251
页数：5
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