High pressure and high temperature in situ X-ray diffraction study on the structural stability of tantalum disilicide

被引：7
|
作者：
Li, C. Y. [1 ,2 ]
Yu, Z. H. [1 ,3 ]
Liu, H. Z. [4 ]
Lu, T. Q. [5 ]
机构：
[1] Harbin Inst Technol, Dept Phys, Harbin 150080, Peoples R China
[2] Brookhaven Natl Lab, Photon Sci Directorate, Upton, NY 11973 USA
[3] Argonne Natl Lab, Adv Photon Source, XSD, Argonne, IL 60439 USA
[4] Harbin Inst Technol, Nat Sci Res Ctr, Harbin 150080, Peoples R China
[5] Harbin Inst Technol, Condensed Matter Sci & Technol Inst, Harbin 150080, Peoples R China
来源：
SOLID STATE COMMUNICATIONS | 2013年 / 157卷
基金：
美国国家科学基金会;
关键词：
Intermetallic compounds; Crystal structure and symmetry; Phase transitions; High temperature and high pressure; TRANSITION-METAL DISILICIDES; ELECTRONIC-STRUCTURE; CRYSTAL-STRUCTURE; PHASE-TRANSITION; SILICIDES; TASI2; C40; SUPERCONDUCTIVITY; RESISTIVITY; PARAMETERS;
D O I：
10.1016/j.ssc.2012.12.020
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
The structural stability in TaSi2 was investigated by in situ angle dispersive X-ray diffraction (AD-XRD), which shows that the structure is stable even up to about 50.0 GPa at room temperature. However, under high pressure and high temperature (HPHT) conditions it was revealed that TaSi2 could undergo a structural phase transition from a C40-type hexagonal phase to a metastable phase after a temperature quench from 573 K at 10.6 GPa. (c) 2012 Elsevier Ltd. All rights reserved.
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页码：1 / 5
页数：5
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