Epitaxial Growth of ZnO by Sol-Gel Method

被引:4
|
作者
Yasuda, Takashi [1 ]
Obata, Yasuhiro [1 ]
Sato, Mitsuru [1 ]
Segawa, Yusaburo [2 ]
机构
[1] Ishinomaki Senshu Univ, Ishinomaki 9868580, Japan
[2] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan
关键词
ZnO; Sol-gel; Epitaxial; Sapphire; MOCVD;
D O I
10.3938/jkps.53.2921
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Epitaxial films of ZnO have been synthesized by the sol-gel method using ZnO buffer layers on sapphire (001) substrates. The buffer layers of 50-nm ZnO were epitaxially grown by metal organic chemical vapor deposition prior to the sol-gel process and significantly improved the crystallinity of the sol-gel ZnO. The six-fold symmetry observed in X-ray diffraction phi-scan spectra confirmed the epitaxial nature of the sol-gel ZnO films. Excitonic recombinations were dominant in the photoluminescence, while defect-related emissions around 3.31 to 3.32 eV, which are commonly observed in polycrystalline sol-gel films, were not observed in the sol-gel ZnO with ZnO buffer layers.
引用
收藏
页码:2921 / 2924
页数:4
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