Kinetic Monte Carlo simulations of nucleation and growth in electrodeposition

被引：31
|
作者：
Guo, L [1 ]
Radisic, A [1 ]
Searson, PC [1 ]
机构：
[1] Johns Hopkins Univ, Dept Mat Sci & Engn, Baltimore, MD 21218 USA
来源：
JOURNAL OF PHYSICAL CHEMISTRY B | 2005年 / 109卷 / 50期
关键词：
D O I：
10.1021/jp055077u
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Nucleation and growth during bulk electrodeposition is studied using kinetic Monte Carlo (KMC) simulations. Ion transport in solution is modeled using Brownian dynamics, and the kinetics of nucleation and growth are dependent on the probabilities of metal-on-substrate and metal-on-metal deposition. Using this approach, we make no assumptions about the nucleation rate, island density, or island distribution. The influence of the attachment probabilities and concentration on the time-dependent island density and current transients is reported. Various models have been assessed by recovering the nucleation rate and island density from the current-time transients.
引用
收藏
页码：24008 / 24015
页数：8
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