Structural characterization of amorphous carbon nitride thin films prepared by pulsed laser deposition

被引:1
|
作者
Aoi, Y [1 ]
Sakurada, K [1 ]
Ono, K [1 ]
Kamijo, E [1 ]
机构
[1] Ryukoku Univ, Fac Sci & Technol, Otsu, Shiga 5202194, Japan
来源
EURO CERAMICS VII, PT 1-3 | 2002年 / 206-2卷
关键词
carbon nitride; thin film; structural characterization; pulsed laser deposition;
D O I
10.4028/www.scientific.net/KEM.206-213.531
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Amorphous carbon nitride thin films were deposited by pulsed laser deposition in nitrogen atmosphere and under nitrogen radical beam irradiation. The deposited films were characterized by scanning electron microscope, x-ray photoelectron spectroscopy (XPS), Raman scattering and Fourier transform infrared spectroscopy (FTIR). The maximum N/C ratio of the deposited film was 0.24 in this experimental. Structural characterization by XPS indicated that the nitrogen atoms in the film were mainly bonded in N-sp(3)C and N-sp(2)C configurations. The ratio of N-sp(3)C slightly increased and the ratio of N-sp(2)C decreased with increasing NIC atomic ratio of the deposited film. FTIR and Raman spectra indicated that N-spC are small as compared with N-sp(3)C and N-sp(2)C.
引用
收藏
页码:531 / 534
页数:4
相关论文
共 50 条
  • [1] Investigation of structural properties of amorphous carbon nitride thin films prepared by xenon cloride pulsed laser deposition of camphoric carbon precursor
    Rusop, M
    Soga, T
    Jimbo, T
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2005, 16 (06) : 367 - 375
  • [2] Investigation of structural properties of amorphous carbon nitride thin films prepared by xenon cloride pulsed laser deposition of camphoric carbon precursor
    M. Rusop
    T. Soga
    T. Jimbo
    [J]. Journal of Materials Science: Materials in Electronics, 2005, 16 : 365 - 375
  • [3] Pulsed laser deposition of amorphous carbon nitride thin films and their electrical properties
    Y. Aoi
    K. Sakurada
    E. Kamijo
    [J]. Applied Physics A, 2004, 79 : 1533 - 1536
  • [4] Pulsed laser deposition of amorphous carbon nitride thin films and their electrical properties
    Aoi, Y
    Sakurada, K
    Kamijo, E
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2004, 79 (4-6): : 1533 - 1536
  • [5] Characterization of boron nitride thin films prepared by femtosecond pulsed laser deposition
    Shimizu, T
    Yoneyama, T
    Sato, S
    [J]. 2005 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, 2005, : 919 - 920
  • [6] Raman scattering analysis of amorphous carbon nitride thin films prepared by pulsed laser deposition at various temperatures
    Rusop, M.
    Soga, T.
    Jimbo, T.
    [J]. TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 30, NO 4, 2005, 30 (04): : 1231 - 1234
  • [7] Water adsorption on amorphous carbon nitride thin films synthesized by pulsed laser deposition
    Kayed, Kamal
    [J]. ADSORPTION-JOURNAL OF THE INTERNATIONAL ADSORPTION SOCIETY, 2024, 30 (06): : 1205 - 1212
  • [8] Thin amorphous chalcogenide films prepared by pulsed laser deposition
    Nemec, P
    Frumar, M
    Jedelsky, J
    Jelínek, M
    Lancok, J
    Gregora, I
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2002, 299 : 1013 - 1017
  • [9] Phases and physical properties of carbon nitride thin films prepared by pulsed laser deposition
    Zhang, ZJ
    Huang, JL
    Fan, SS
    Lieber, CM
    [J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1996, 209 (1-2): : 5 - 9
  • [10] Synthesis of carbon nitride composite thin films prepared by pulsed laser deposition method
    Kumar, A
    Inturi, RB
    Ekanayake, U
    Chan, HL
    You, Q
    Wattuhewa, G
    Barnard, JA
    [J]. LAYERED MATERIALS FOR STRUCTURAL APPLICATIONS, 1996, 434 : 189 - 194