Physical dissipation mechanisms in non-contact atomic force microscopy

被引：21
|
作者：
Trevethan, T [1 ]
Kantorovich, L [1 ]
机构：
[1] Kings Coll London, Dept Phys, London WC2R 2LS, England
来源：
NANOTECHNOLOGY | 2004年 / 15卷 / 02期
关键词：
D O I：
10.1088/0957-4484/15/2/010
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Using realistic molecular dynamics simulations on the MgO(001) surface we show that the friction coefficient and dissipation energies due to the stochastic friction force mechanism are much smaller than observed experimentally in close agreement with previous analytical models. Therefore, the method is generalized by including a single soft vibrational mode at the surface. Using methods of non-equilibrium statistical mechanics, we derive an equation of motion for the tip interacting with the soft mode. It is shown that this method enables the simultaneous description of both stochastic friction and adhesion.
引用
收藏
页码：S44 / S48
页数：5
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