Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon

被引：1
|
作者：
Bai Yang [1 ]
Jin Chenggang [1 ]
Yu Tao [1 ]
Wu Xuemei [1 ]
Zhuge Lanjian [2 ]
Ning Zhaoyuan [1 ]
Ye Chao [1 ]
Ge Shuibing [1 ]
机构：
[1] Soochow Univ, Sch Phys Sci & Technol, Suzhou 215006, Peoples R China
[2] Soochow Univ, Anal Testing Ctr, Suzhou 215123, Peoples R China
来源：
PLASMA SCIENCE & TECHNOLOGY | 2013年 / 15卷 / 10期
基金：
中国国家自然科学基金;
关键词：
one-turn bare coil; inductively coupled plasma; dual-frequency capacitively coupled plasma; Langmuir probe; electron energy probability function; ELECTRON-ENERGY DISTRIBUTION;
D O I：
10.1088/1009-0630/15/10/08
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
The dual-frequency capacitively coupled plasma (DF-CCP) with inductive enhancement system is a newly designed plasma reactor. Different from the conventional inductively coupled plasma (ICP) reactors, now a radio frequency (rf) power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP. This paper gives a detailed description of its structure. Moreover, investigations on some characteristics of discharges in this apparatus were made via a Langmuir probe.
引用
收藏
页码：1002 / 1005
页数：4
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