An Extended Kalman Filter based method for fast in-situ etch rate measurements

被引：0
|
作者：
Vincent, TL [1 ]
Khargonekar, PP [1 ]
Terry, FL [1 ]
机构：
[1] UNIV MICHIGAN,DEPT EECS,ANN ARBOR,MI 48109
来源：
DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS PROCESSING II | 1996年 / 406卷
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：87 / 93
页数：7
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