Three-dimensional state-of-the-art topography simulation

Two major contenders in the field of topography simulation, the level set method [1] and an advanced cell based algorithm [2, 3] are compared. The focus of this comparison is placed on both accuracy and performance. Isotropic deposition using a realistic trench structure with non-orthogonal surfaces is employed for bench-marking the two methodologies. This simulation enables a very in depth analysis of the relative error, the simulation time and, the number of required discretization points. The calculations are performed using the simulators TOPO3D for the cellular algorithm and TOPO3D-II for the level set method. Both have been integrated into a process flow simulation.