Transient junction-to-case thermal resistance measurement methodology of high accuracy and high repeatability

被引:33
|
作者
Szabó, N
Steffens, O
Lenz, M
Farkas, G
机构
[1] MicReD Ltd, H-1112 Budapest, Hungary
[2] Infineon Technol AG, D-93049 Regensburg, Germany
[3] Infineon Technol AG, D-81541 Munich, Germany
关键词
heat conductance path; junction-to-case thermal resistance measurement; measurement repeatability; structure functions;
D O I
10.1109/TCAPT.2005.859768
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High-power packages show a characteristic three-dimensional heat flow resulting in large lateral changes in chip and case surface temperature. This paper proposes an unambiguous definition for the R-thJC junction-to-case thermal resistance as a key parameter of such packages based on a transient measurement technique ensuring high repeatability even at very low R-th values. The technique is illustrated on thermal transient measurements of high-power MOSFET devices. It is also presented how the same measurement results can be used for die attach quality analysis. Finally, a comparative method is shown for measuring the differences of Rth values among samples with many times higher resolution compared with a direct R-thJC measurement.
引用
收藏
页码:630 / 636
页数:7
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