Synthesis by aerosol assisted chemical vapor deposition and microstructural characterization of PbTiO3 thin films

被引:6
|
作者
Ramos-Cano, J. [1 ]
Hurtado-Macias, A. [1 ]
Antunez-Flores, W. [1 ]
Fuentes-Cobas, L. [1 ]
Gonzalez-Hernandez, J. [1 ]
Amezaga-Madrid, P. [1 ]
Miki-Yoshida, M. [1 ]
机构
[1] Ctr Invest Mat Avanzados SC, Lab Nacl Nanotecnol, Chihuahua 31109, Mexico
关键词
Ferroelectrics; Aerosol-assisted chemical vapor deposition; Lead titanate; Thin films; X-ray diffraction; Scanning electron microscopy; Transmission electron microscopy; ELECTRICAL-PROPERTIES; SPRAY-PYROLYSIS; PB(ZR; TI)O-3; PLASMA; GROWTH; NANO;
D O I
10.1016/j.tsf.2013.01.021
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin films of PbTiO3 were deposited onto (001) silicon single-crystal substrates by aerosol assisted chemical vapor deposition method at different temperatures, using organometallic precursors. With the objective of stabilizing and homogenizing the perovskite phase, the films were annealed at 800 degrees C, in a Pb-rich atmosphere, for 4 and 6 h. The evolution of compositions and microstructure of the films was characterized before and after annealing, by grazing incidence X-ray diffraction, two-dimensional detection of grazing incidence diffraction with synchrotron radiation, scanning electron microscopy and high resolution transmission electron microscopy. X-ray diffraction results showed that the crystalline structure of optimized PbTiO3 films corresponded to a tetragonal perovskite-type, with lattice parameters a=0.387(4) nmand c=0.406(4) nm. In addition, the inverse pole figure of the fiber texture representation, had a Gaussian (1, 1, 0) component and distribution width Omega=15 degrees. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:179 / 184
页数:6
相关论文
共 50 条
  • [1] METALORGANIC CHEMICAL VAPOR-DEPOSITION OF PBTIO3 THIN-FILMS
    KWAK, BS
    BOYD, EP
    ERBIL, A
    APPLIED PHYSICS LETTERS, 1988, 53 (18) : 1702 - 1704
  • [2] Fabrication of PbTiO3 thin films by laser metallorganic chemical vapor deposition
    Japan Energy Corp, Todashi Saitama, Japan
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1997, 121 (1-4): : 408 - 411
  • [3] Plasma-enhanced chemical vapor deposition of PbTiO3 thin films
    Tong, MS
    Dai, GR
    Gao, DS
    MATERIALS LETTERS, 2000, 46 (2-3) : 60 - 64
  • [4] Fabrication of PbTiO3 thin films by laser metalorganic chemical vapor deposition
    Tokita, K
    Okada, F
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 121 (1-4): : 408 - 411
  • [6] Preparation of Al-doped PbTiO3 thin films by metalorganic chemical vapor deposition and their characterization
    Aratani, M
    Nagashima, K
    Iijima, T
    Mizuhira, M
    Funakubo, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (6A): : 3591 - 3595
  • [7] Preparation of Al-doped PbTiO3 thin films by metalorganic chemical vapor deposition and their characterization
    Aratani, Masanori
    Nagashima, Kuniharu
    Iijima, Takashi
    Mizuhira, Manabu
    Funakubo, Hiroshi
    2000, JJAP, Tokyo, Japan (39):
  • [8] PREPARATION OF PBTIO3 THIN-FILMS BY SPUTTER ASSISTED PLASMA CHEMICAL VAPOR-DEPOSITION METHOD
    MOCHIZUKI, S
    KIMURA, S
    MAKABE, R
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 : 15 - 17
  • [9] Metalorganic chemical vapor deposition of ferroelectric PbTiO3 thin films on amorphous substrate
    Nanjing Univ, Nanjing, China
    Ferroelectr Lett Sect, 1-2 (1-9):
  • [10] Epitaxial growth of ferroelectric PbTiO3 thin films by metalorganic chemical vapor deposition
    Ma, WH
    Chen, YF
    Zhang, MS
    Ming, NB
    FERROELECTRICS, 1997, 195 (1-4) : 187 - 190