Fermi-level dependence of formation of hydrogen molecules in crystalline silicon

被引:0
|
作者
Ishioka, K [1 ]
Umehara, N
Mori, T
Ohtsuka, K
Kitajima, M
Murakami, K
Hishita, S
机构
[1] Natl Inst Mat Sci, Mat Engn Lab, Tsukuba, Ibaraki 3050047, Japan
[2] Univ Tsukuba, Inst Mat Sci, Tsukuba, Ibaraki 3058573, Japan
[3] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan
关键词
hydrogen molecules; crystalline silicon; Fermi level;
D O I
10.1016/S0921-4526(01)00678-0
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We report a systematic investigation on the Fermi-level dependence of the formation of two different types of hydrogen molecules in silicon. Hydrogen molecule at the tetrahedral (T) site (H-2(T)) is formed only in heavily doped n-type below 200degreesC, but is observed both in the n- and p-type above 200degreesC. The temperature dependence is due to the increase of the thermally activated carrier concentration. The possible precursors of the H-2(T) are H+(BC) and H-0(BC) in the p-type, and H-(T) and H-0 in the n-type. The Fermi level dependence of the formation of the hydrogen molecule trapped in platelets (H-2(p)) above 250degreesC is very different from that below 250degreesC. The result suggests that platelets are formed from hydrogen-complexes other than the H-2(*) above 250degreesC. (C) 2001 Elsevier Science B.V. All rights reserved.
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页码:163 / 166
页数:4
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