Magnetoresistance of spin-dependent tunnel junctions with composite electrodes

被引:6
|
作者
Ho, CH
Lin, MT [1 ]
Yao, YD
Lee, SF
Liao, CC
Chen, FR
Kai, JJ
机构
[1] Natl Taiwan Univ, Dept Phys, Taipei 106, Taiwan
[2] Acad Sinica, Inst Phys, Taipei 115, Taiwan
[3] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 300, Taiwan
关键词
D O I
10.1063/1.1419259
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spin-dependent tunnel junctions, Co/Al2O3/Co (CoFe)/NiFe, were fabricated to investigate the effect of the additional Co (CoFe) interlayer on tunneling magnetoresistance. The quality of the junction was examined with a cross-sectional image generated by high-resolution transmission electron microscopy, and an electron energy loss spectra map. For junctions with a Co (CoFe) interlayer in the top electrode thinner than 0.8 nm (1.0 nm), the tunneling magnetoresistance ratio increases with interlayer thickness. For junctions with a 0.8-2.0 nm Co (1.0-2.0 nm CoFe) interlayer in the top electrode, the tunneling magnetoresistance ratio reaches the maximum value of 2.16 (4.45) times that without any Co (CoFe) interlayer in the top electrode. The increase in the tunneling magnetoresistance ratio may be attributed to the increased effective ferromagnetic electrode polarization and the various spin-flip scattering factors. (C) 2001 American Institute of Physics.
引用
收藏
页码:6222 / 6225
页数:4
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