Liquid-immersion inclined UV lithography using cube prism and mirrors

被引:0
|
作者
Kagawa, Gakuto [1 ]
Sugimoto, Takumi [1 ]
Takahashi, Hidetoshi [1 ]
机构
[1] Keio Univ, Dept Mech Engn, Fac Sci & Technol, Kouhoku Ku, 3-14-1 Hiyoshi, Yokohama, Kanagawa 2238522, Japan
关键词
inclined UV lithography; liquid immersion; MEMS; FABRICATION; POLYMER; MICROSTRUCTURES; EXPOSURE;
D O I
10.35848/1882-0786/ac97da
中图分类号
O59 [应用物理学];
学科分类号
摘要
This paper reports on the inclined UV lithography based on liquid immersion. The proposed method implements liquid immersion, allowing structures to be formed with a large inclination angle. The equipment comprises two adjustable mirrors and a cubic glass with a pure water chamber. UV light rays are reflected and passed through the mirrors and chamber, irradiating the target at an inclined angle. We developed the necessary equipment and fabricated the 3D microstructures. The results revealed that the inclination angle reached up to 49 degrees, indicating exposures beyond the limits of conventional inclined UV lithography.
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页数:4
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