INFLUENCE OF MULTIPOLAR MAGNETIC FIELD GEOMETRY OF ECR PLANAR PLASMA SOURCE ON PLASMA PARAMETERS

被引：0
|
作者：
Fedorchenko, V. D. [1 ]
Chebotarev, V. V. [1 ]
Garkusha, I. E. [1 ]
Medvedev, A. V. [1 ]
Tereshin, V. I. [1 ]
Shevchuk, B. A. [1 ]
机构：
[1] Kharkov Phys & Technol Inst, Natl Sci Ctr, Inst Plasma Phys, UA-61108 Kharkov, Ukraine
来源：
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY | 2008年 / 06期
关键词：
D O I：
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中图分类号：
O57 [原子核物理学、高能物理学];
学科分类号：
070202 ;
摘要：
The plasma parameters and its homogeneity were measured in ECR planar plasma source with multipolar magnetic field, which is created by three parallel magnetic bars of 12 cm in length consisted of set of the permanent magnets of 2 cm length. Geometry of the multipolar magnetic field is able to be changed by variation of the polarity and the distance between separate magnets along the bars. For magnetic system with alternative orientation of the magnetic field the plasma density up to 2.8 x 10(10) cm(-3) and the electron temperature about 20-22 eV were measured within the area similar to 75 cm(2) at the distance of 2 cm apart the magnetic structure. The uncompensated ion flow with the energies of 16-18 eV was observed for all configurations of magnetic field.
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页码：201 / 203
页数：3
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